Patent Profile
| Patent No: | US6592751 [USA] | Application No: | 09/962440 |
| Title: | Device for treatment of wastewater | ||
| Issue Date: | 15-07-2003 | File Date: | 26-09-2001 |
| Inventor(s): | AJIT HARIDAS | ||
| IPC Classification: | C02F003/28 | ||
| Abstract: | A high-rate reactor system, (applying a high superficial velocity), capable of treating partially soluble, complex, high-strength wastewater. The reactor system is configured in multiple stages and has the ability to retain complex insoluble substrates in a wide range of particle sizes in spatially separate stages for sufficient residence time to enable complete degradation. A vertically oriented vessel has neighboring upper and lower chambers, each chamber having a gas retention space and a liquid retention space. A filter chamber has an inlet communicating with the liquid retention space of the lower chamber and an outlet communicating with the liquid retention space of the upper chamber. A gas conduit communicates the gas retention space of the lower chamber with the gas retention space of the upper chamber. A discharge device enables gas to be periodically discharged from the lower chamber to the upper chamber through the gas conduit. | ||
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Industrial Applications
Devices and Equipments [Environmental (Clean Tech)]
Water treatment [Environmental (Clean Tech)]