New Invention Profile
| Publication No: | IN202411004776 [India] | Application No: | IN202411004776 |
| Title: | Modified photocurable peek photopolymer for 3d printing and preparations thereof | ||
| Publication Date: | 08-08-2025 | File Date: | 23-01-2024 |
| Inventor(s): | Asha Syamakumari; Shibam Pal; Yogesh Mohan Gaikwad | ||
| IPC Classification: | C08L71/00, B33Y70/00 | ||
| Abstract: | The present invention relates to a novel photocurable acrylate PEEK (Polyether ether ketone) polymer with a modified chemical structure of formula I, useful in DLPÂ (digital light processing) 3D printing. Formula-I wherein Ar is an aromatic unit, R is radical polymerizable unit, and x is in the range of 10 to 50. |
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CSIR-National Chemical Laboratory[CSIR-NCL]
: director[at]ncl[dot]res[dot]in
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: director[at]ncl[dot]res[dot]in
:91-20- 25902600, 25902028
:http://www.ncl-india.org/
Industrial Applications
Applications/Use [Materials]
Chemistry, Chemical Processes Polymers [Chemistry, Chemical Processes]
Materials Processes [Materials]
Polymers [Materials]