New Invention Profile
| Publication No: | IN202411043451 [India] | Application No: | IN202411043451 |
| Title: | Process for maintaining optimum gas pressure for improved performance of sealed-off high power plasma switches | ||
| Publication Date: | 19-12-2025 | File Date: | 04-06-2024 |
| Inventor(s): | Bharat Lal Meena; Udit Narayan Pal; Ram Prakash Lamba; Akhilesh Mishra; Mahendra Singh; Alok Mishra | ||
| IPC Classification: | H01J37/32 | ||
| Abstract: | The present invention provide a process for maintaining optimum gas pressure for improved performance of sealed-off high power plasma switches comprising the steps of: activation, loading, and characterization of reservoir to maintain the optimum pressure of hydrogen and deuterium gases in the sealed-off high power plasma switches for their improved performance. The present invention is suitable gas volume for maintaining the precise and accurate gas pressure in the high-power plasma switches. Further, reservoir characteristics have been studied for the different amounts of gas pressure loading and required heater power for better outcomes for the pulsed power applications. The present invention process is used in different types of high-power plasma switches for the switching performance evaluation at the optimized gas pressure. |
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: director[at]ceeri[dot]res[dot]in
:91-1596-242111
:https://www.ceeri.res.in